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There is now a CONTENT FREEZE for Mercury while we switch to a new platform. It began on Friday, March 10 at 6pm and will end on Wednesday, March 15 at noon. No new content can be created during this time, but all material in the system as of the beginning of the freeze will be migrated to the new platform, including users and groups. Functionally the new site is identical to the old one. webteam@gatech.edu
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Atlanta, GA | Posted: April 19, 2011
Congratulations to Kania Sethi and her Advisor, Rao Tummala, on winning the IEEE 2011 ECTC Travel Award for “Conformal Atomic Layer Deposition (ALD) of Alumina on High Surface-Area Porous Copper Electrodes to Achieve Ultra-High Capacitance Density on Silicon” at the 61th IEEE Electronic Components and Technology Conference, which will be held in Lake Buena Vista, Florida this coming June. This honor is shared with coauthors Dr. Himani Sharma, Dr. PM Raj, Prof. Rao Tummala of Georgia Tech along with Mr. Andy Fenner and Ms. Anna Malin of Medtronics.
System integration and miniaturization demands are driving integrated thin film capacitor technologies with ultra-high capacitance densities for noise-free power supply, power conversion and efficient power management. There is also a new emerging need for voltage regulation and power supply in bio-electronic and portable consumer products that is driving up the capacitance densities to above 100µF/cm2 with high Breakdown Voltages (BDV) and low leakage current. The volumetric efficiency of high-density capacitors, however, has only gone through incremental changes over the past few decades because of several fundamental limitations. This paper describes an innovative approach to achieve very high capacitance density on silicon interposers than what has been reported with trench capacitors. The approach consists of a novel silicon-compatible, low-temperature sinterable metal particulate electrode and a conformal moderate-permittivity dielectric to attain the high capacitance density with high volumetric efficiency.
Congratulations, Kanika!
