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There is now a CONTENT FREEZE for Mercury while we switch to a new platform. It began on Friday, March 10 at 6pm and will end on Wednesday, March 15 at noon. No new content can be created during this time, but all material in the system as of the beginning of the freeze will be migrated to the new platform, including users and groups. Functionally the new site is identical to the old one. webteam@gatech.edu
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Contact for More Information About this Series:
Dr. Paul Joseph: Principal Research Scientist & SENIC External User Coordinator
Institute for Electronics & Nanotechnology, Georgia Institute of Technology
paul.joseph@ien.gatech.edu
Contact for More Information About Research News & Events at IEN:
Ms. Christa Ernst: Research Communications Program Manager
Institute for Electronics and Nanotechnology & Institute for Materials, Georgia Institute of Technology
christa.ernst@ien.gatech.edu
Summary Sentence: The Southeastern Nanotechnology Infrastructure Corridor (SENIC) is hosting a series of online technical seminars discussing cleanroom fabrication and processing for materials, biological, and electronics research.
Full Summary: No summary paragraph submitted.
Hang ChenHang Chen, Ph.D., Georgia Tech Institute for Electronics and Nanotechnology (GT-IEN)
"The Southeastern Nanotechnology Infrastructure Corridor (SENIC) housed at the Institute for Electronics and Nanotechnology at Georgia Tech is hosting a series of online technical seminars, from 11am - 12pm, open to the academic and industrial community with an interest in cleanroom fabrication and processing for materials, biological, and electronics research.
We invite you to join us at any of the lectures by registering at the link at the bottom of the page. On the registration form, please check the seminars for which you are interested (you are not limited in the number) so that appropriate accompanying materials, if needed, are prepared."
Abstract: Photolithography has always been the most important technique in microelectronics fabrication. It uses light to transfer a geometric pattern from a photomask (also called an optical mask) to a photosensitive (that is, light-sensitive) chemical photoresist on the substrate, or it can be directly written with a UV-laser equipment. It provides precise control of the shape and size of the objects it creates and can create patterns over an entire surface cost-effectively. The Georgia Tech Institute for Electronics and Nanotechnology (IEN) cleanroom provides various types of photolithography equipment to satisfy different processing needs. Each tool has its own unique characteristics and serves different purposes. In this seminar, a brief introduction to the equipment and patterning capabilities of the IEN will be presented. Common processing issues related to photolithography will also be discussed.
Bio: Dr. Hang Chen received his bachelor and master degrees in chemistry from Fudan University in Shanghai, China. He obtained his doctorate, also in chemistry, from Georgia Tech in 2005 and was a post-doc at the Nanotechnology Research Center before joining the IEN as a Research Scientist in 2008. Currently, he is the process support manager at IEN. His research interests include chemically sensitive field-effect transistors, MEMS-CMOS device integration, and organic electronics.
Join the Online Event May 14th at this Link: https://bluejeans.com/883593994
Registration Link: https://tinyurl.com/IENexperts2
The other events are below....
May 21: "Laser Micromachining at GT-IEN"
May 28: "Etching at GT-IEN: A Review of Processes and Equipment"
