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There is now a CONTENT FREEZE for Mercury while we switch to a new platform. It began on Friday, March 10 at 6pm and will end on Wednesday, March 15 at noon. No new content can be created during this time, but all material in the system as of the beginning of the freeze will be migrated to the new platform, including users and groups. Functionally the new site is identical to the old one. webteam@gatech.edu
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The Elionix ELS-G100 is a direct write electron beam lithography system that uses a 100 kV acceleration voltage and a 1.8 nm spot Gaussian beam to achieve nanometer scale resolution. The Elionix electron beam lithography tools are known for ultra-high precision to fabricate small nano-structures with excellent reliability. The ELS G-100 is capable of generating patterns with a line width of 5 nm. A 20bit DAC provides high beam positioning resolution. In addition, the laser interferometer with its reading resolution of 0.31 nm enables a stitching accuracy of 15 nm and overlay accuracy of 20 nm. The tool features a maximum field size of 1 mm and a scanning frequency of 100 MHz. Sample sizes can be handled from small millimeter size pieces up to full 8” diameter wafers.This 30-minute webinar will provide an overview of the ELS-G100 system with a discussion of key features and capabilities followed by time for Q & A.
Who should attend: Faculty, scientists, engineers, researchers, and technical staff from university, company, or government labs who are interested in learning about how electron beam lithography capability might enable their research efforts.
REGISTER FOR THE WEBINAR AT THIS LINK
