ELECTRON BEAM LITHOGRAPHY SEMINAR WITH ELIONIX

*********************************
There is now a CONTENT FREEZE for Mercury while we switch to a new platform. It began on Friday, March 10 at 6pm and will end on Wednesday, March 15 at noon. No new content can be created during this time, but all material in the system as of the beginning of the freeze will be migrated to the new platform, including users and groups. Functionally the new site is identical to the old one. webteam@gatech.edu
*********************************

Event Details
  • Date/Time:
    • Friday April 20, 2018 - Saturday April 21, 2018
      12:00 pm - 12:59 pm
  • Location: Marcus Nanotech 1117-1118 | 345 Ferst Drive Atlanta GA | 30332
  • Phone: (404) 894-1665
  • URL: IEN
  • Email: info@ien.gatech.edu
  • Fee(s):
    N/A
  • Extras:
    Free food
Contact

Devin Brown | E-Beam Support Lead, Senior Research Engineer
devin.brown@ien.gatech.edu

Summaries

Summary Sentence: This seminar will highlight the newly installed Elionix ELS-G100 Electron Beam Lithography System to the Marcus Inorganic Cleanroom.

Full Summary: No summary paragraph submitted.

Related Files

NEW TECHNOLOGY CAPABILITY ANNOUNCEMENT
Elionix ELS-G100 Electron Beam Lithography System
Friday, April 20, 2018 | 12pm - 1pm | Marcus Nanotech 1117-1118

This seminar will highlight the newly installed Elionix ELS-G100 Electron Beam Lithography System to the Marcus Inorganic Cleanroom. Attendees will receive a general introduction to e-beam lithography, i.e. direct-writing of user-defined CAD patterns with a beam of high-energy electrons. Additionally, the speaker will walk you through some of the advanced e-beamlithographytopics by using Elionix ELS-G100 as a model system.

Seminar Topics

  • E-beam system configuration and its components
  • Principles of operation for ebeam exposure
  • Limits of e-beam and its implications
  • Proximity effect in ebeam exposure
  •  Effect of post-exposure processing

Tool Specifications

  • Generates patterns with a line width of 6nm with an 8” stage
  • Stable 1.8nm electron beam using high beam current at 100kV
  • 20bit DAC provides high beam positioning resolution
  • At a beam current of 1nA, 20nm lines can be written over an entire
  • 500μm field without stitching

Speaker: Yong Sun - A dedicated and driven scientist by training, with 15 years of hands-on nanofabrication experience in the semiconductor field, Yong has worked
both in academia and in industry, with research interests spanning across a varietyof subjects, including sensors, microfluidics, metamaterials, Li-Ion battery and energy
converters, to name a few. I am currently the Product Manager at SEMTech Solutions, collaborating with a group of dedicated engineers to advance the Elionix e-beam technology. Before joining the Elionix team, I have worked as a cleanroom manager at Princeton University, teaching users on the operation of many lithography tools,including Elionix ELS-F125.

Additional Information

In Campus Calendar
Yes
Groups

3D Systems Packaging Research Center, Georgia Electronic Design Center (GEDC), Institute for Electronics and Nanotechnology, NanoTECH, The Center for MEMS and Microsystems Technologies

Invited Audience
Faculty/Staff, Public, Graduate students, Undergraduate students
Categories
Career/Professional development, Seminar/Lecture/Colloquium
Keywords
the Institute for Electronics and Nanotechnology, Integrated 3D Systems Group; Center for Co-design of Chip, nanolithography, E-Beam lihography, cleanroom techniques, cleanroom training, CAD
Status
  • Created By: Christa Ernst
  • Workflow Status: Published
  • Created On: Apr 11, 2018 - 10:39am
  • Last Updated: Apr 11, 2018 - 10:43am