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There is now a CONTENT FREEZE for Mercury while we switch to a new platform. It began on Friday, March 10 at 6pm and will end on Wednesday, March 15 at noon. No new content can be created during this time, but all material in the system as of the beginning of the freeze will be migrated to the new platform, including users and groups. Functionally the new site is identical to the old one. webteam@gatech.edu
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Tom Edgar of the University of Texas presents A Batch Process Control Framework for Semiconductor Manufacturing as part of ChBE's Fall 2006 Seminar Series.
Refreshments will be served from 3:30-4:00PM
The seminar will be held 4:00-5:00PM
Abstract
Advances in modeling and control will be required to meet future technical challenges in semiconductor manufacturing. For batch processes such as occur in semiconductor fabrication, modeling and control must be incorporated into a multi-level framework including sequential control, within-the-batch control, run-to-run control, fault detection, and factory control. Implementation challenges include a lack of suitable in situ measurements, variations in process equipment characteristics and wafer properties, limited process understanding, and non-automated operational practices. This presentation reviews how basic research findings in modeling and control have influenced commercial applications in key unit operations such as lithography and plasma etching as well as in overall factory control.
