*********************************
There is now a CONTENT FREEZE for Mercury while we switch to a new platform. It began on Friday, March 10 at 6pm and will end on Wednesday, March 15 at noon. No new content can be created during this time, but all material in the system as of the beginning of the freeze will be migrated to the new platform, including users and groups. Functionally the new site is identical to the old one. webteam@gatech.edu
*********************************
Hang Chen: hang.chen@ien.gatech.edu
Summary Sentence: Ushio’s Projection Mask Aligner UX-44101, engineered for the manufacturing of MEMS devices, is available for use by faculty and students users at the Institute for Electronics and Nanotechnology.
Full Summary: No summary paragraph submitted.
Projection Mask Aligner UX-44101Abstract: Ushio’s Projection Mask Aligner UX-44101, engineered for the manufacturing of MEMS devices, is available for use by faculty and students users at the Institute for Electronics and Nanotechnology. The lithographic tool was installed in the Packaging Research Center’s laboratory last year, and will be available until May of 2015.
The UX-44101 has a minimum exposure area of 100 mm diameter, with the maximum capability to visualize the entire area of a 4” wafer with one exposure. Within the 80 mm x 60mm area range, 2µm L/S of resolution is achievable using samples prepared with a thin photoresist. The depth of focus for the UX-44101 is +/- 10 µm. The UX-44101’s large depth of focus is highly useful for 3D MEMS structure visualization and device manipulation.
The UX-44101 has a dedicated operator in the Packaging Research Center laboratory who will operate the tool for users who have had no prior instruction in the use of mask aligners or characterization tools.
Bio: Ryuta Furuya received B.S. and M.S. degree of Physics from University of Tokyo, Tokyo, Japan in 2010 and 2012 respectively. He joined USHIO.Inc at 2012 as a research engineer. He is currently working at Georgia Institute of Technology 3-D Packaging Research Center (GT-PRC). His recent research is development of panel base process for 2.5-D glass/organic interposer. His current interests include projection lithography optics and MEMS packaging.
